PMMA spin coated and baked onto a silicon dioxide wafer in preparation for electron beam lithography.
Evaporated gold electric contacts creating a graphene circuit. Large gold contacts are approximately 50 μm (0.0019685 inches)
Hexagonal Boron Nitride laid on top of evaporated gold contacts creating a two dimensional graphene circuit.
PPMA coated silicon surface with electron beam lithography etched windows exposing the substrate.